The Permeable Base Transistor (PBT) is generally considered as an interesting device for high speed applications. PBTs have been fabricated on Silicon and Gallium Arsenide by a number of groups. In this paper we reported on the fabrication of an etched groove PBT structure on 6H-SiC using Ti as contact metal for all electrodes. The devices have been characterised by DC-measurements. The transistors show the normal IV-characteristics for a such a device except for a parasitic series diode at the drain electrode. The breakdown voltage of the gate-drain diode is generally as high as around 60 V even without passivation of the sidewalls of the grooves.