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A comparison between different Monte Carlo models in simulation of hole transport in 4H-SiC
Mathematics and Computers in Simulation. 2001; 55(1-3):199-208
Dummy photo Prof. Hans-Erik Nilsson
NMT

Publication type:
Article in journal

Permanent link (URI):
http://urn.kb.se/resolve?urn=urn:nbn:se:miun:diva-1866

ISSN:
0378-4754

Abstract:

A Monte Carlo (MC) study of the hole transport in 4H-SiC is presented using three different MC models. The three models represent different approximation levels regarding band structure and scattering formulation. The most advanced model is a completely k-vector dependent full band model while the simplest model uses three analytical bands with energy dependent scattering rates. The intermediate MC model uses a full band structure calculated using a simple k.p formulation. A comparison between the models in terms of coupling constants, scattering rate, temperature dependent mobility and saturation velocity is presented




Authors:
Nilsson H, Bellotti E, Hjelm M, Brennan K

SCB areas:
Annan elektroteknik och elektronik